Challenges for line width / line edge roughness (LWR/lER) improvement in Directed Self-Assembly (DSA) advanced patterning

Chan, BTBTChanPathangi Sriraman, HariHariPathangi SriramanSingh, ArjunArjunSinghEl Otell, ZiadZiadEl OtellGronheid, RoelRoelGronheidde Marneffe, Jean-FrancoisJean-Francoisde MarneffePiumi, DanieleDanielePiumi2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25049Challenges for line width / line edge roughness (LWR/lER) improvement in Directed Self-Assembly (DSA) advanced patterningProceedings paper