A practical application of multiple parameters profile characterization (MPPC) using CD-SEM on production wafers using Hyper-NA lithography

Ishimoto, ToruToruIshimotoSekiguchi, KoheiKoheiSekiguchiHasegawa, NorioNorioHasegawaWatanabe, KenjiKenjiWatanabeLaidler, DavidDavidLaidlerCheng, ShauneeShauneeCheng2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15526A practical application of multiple parameters profile characterization (MPPC) using CD-SEM on production wafers using Hyper-NA lithographyProceedings paper