Houssiau, L.L.HoussiauVitchev, R.G.R.G.VitchevPireaux, J.J.J.J.PireauxConard, ThierryThierryConardBender, HugoHugoBenderRichard, OlivierOlivierRichardMack, P.P.MackWolstenholme, J.J.WolstenholmeDefranoux, C.C.Defranoux2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7668Multitechnique characterisation of Al203 thin layers deposited on SiO2/Si surface by atomic layer chemical vapour depositionProceedings paper