ALD growth behavior of high-k nanolayers on various substrates characterized by X-Ray Spectrometry in gracing incidence geometry

Müller, MatthiasMatthiasMüllerSioncke, SonjaSonjaSionckeDelabie, AnneliesAnneliesDelabieBeckhoff, BurkhardBurkhardBeckhoff2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/22830ALD growth behavior of high-k nanolayers on various substrates characterized by X-Ray Spectrometry in gracing incidence geometryProceedings paper