Mallik, ArindamArindamMallikDebacker, PeterPeterDebackerMcIntyre, GregGregMcIntyreKim, Ryan Ryoung hanRyan Ryoung hanKimRonse, KurtKurtRonse2021-10-252021-10-252018https://imec-publications.be/handle/20.500.12860/31272EUVL Gen 2.0: Key requirements for constraining semiconductor cost in advanced technology node manufacturingProceedings paperhttps://doi.org/10.1117/12.2297447