Applying design-based metrology for calibrating an OPC model for FinFET pattering

Vandeweyer, TomTomVandeweyerLorusso, GianGianLorussoDelvaux, ChristieChristieDelvauxDe Backer, JohanJohanDe BackerJandhyala, RadhikaRadhikaJandhyalaAzordegan, AmirAmirAzordeganAbott, GordonGordonAbottKaliblotzky, ZeevZeevKaliblotzkyErcken, MoniqueMoniqueErcken2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11474Applying design-based metrology for calibrating an OPC model for FinFET patteringProceedings paper