Roughness characterization in the frequency domain and linewidth roughness mitigation with post-lithography processes

Vaglio Pret, AlessandroAlessandroVaglio PretGronheid, RoelRoelGronheidFoubert, PhilippePhilippeFoubert2021-10-182021-10-182010-121537-1646https://imec-publications.be/handle/20.500.12860/18128Roughness characterization in the frequency domain and linewidth roughness mitigation with post-lithography processesJournal article