Atomic layer deposition process of Hf-based high-k gate dielectric film on Si substrate

Park, Tae JooTae JooParkCho, Moon JuMoon JuChoJung, Hyung-SukHyung-SukJungHwang, cheol seongcheol seongHwang2021-10-202021-10-202012-08https://imec-publications.be/handle/20.500.12860/21256Atomic layer deposition process of Hf-based high-k gate dielectric film on Si substrateBook chapterhttp://eu.wiley.com/WileyCDA/WileyTitle/productCd-3527330321.html