Controlled isotropic etches for Gate-All-Around (GAA) device architectures

Muraki, YusukeYusukeMurakiOniki, YusukeYusukeOnikiKenis, KarineKarineKenisAltamirano Sanchez, EfrainEfrainAltamirano SanchezHolsteyns, FrankFrankHolsteynsKal, SubhadeepSubhadeepKalAlix, CherylCherylAlixKumar, KaushikKaushikKumarMosden, AelanAelanMosden2021-10-292021-10-292020https://imec-publications.be/handle/20.500.12860/35627Controlled isotropic etches for Gate-All-Around (GAA) device architecturesOral presentationhttps://www.linx-consulting.com/wp-content/uploads/2020/08/LINX_SPCC2020_Agenda_R12.pdf