Grazing incidence X-ray fluorescence spectrometry for compositional analysis of nanometer-thin high-k dielectric HfO2 layers

Hellin, DavidDavidHellinDelabie, AnneliesAnneliesDelabiePuurunen, RiikkaRiikkaPuurunenBeaven, PeterPeterBeavenConard, ThierryThierryConardBrijs, BertBertBrijsDe Gendt, StefanStefanDe GendtVinckier, ChrisChrisVinckier2021-10-162021-10-162005-07https://imec-publications.be/handle/20.500.12860/10562Grazing incidence X-ray fluorescence spectrometry for compositional analysis of nanometer-thin high-k dielectric HfO2 layersJournal article