Ercken, MoniqueMoniqueErckenDelvaux, ChristieChristieDelvauxBaerts, ChristinaChristinaBaertsLocorotondo, SabrinaSabrinaLocorotondoDegroote, BartBartDegrooteWiaux, VincentVincentWiauxNackaerts, AxelAxelNackaertsRooyackers, RitaRitaRooyackersVerhaegen, StafStafVerhaegenPollentier, IvanIvanPollentier2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/8887Challenges in patterning 45nm node multiple-gate devices and SRAM cellsProceedings paper