Resolution - line width roughness - sensitivity trade-offs in photoresists for advanced lithography

Gronheid, RoelRoelGronheidVan Steenwinckel, DavidDavidVan Steenwinckel2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13820Resolution - line width roughness - sensitivity trade-offs in photoresists for advanced lithographyOral presentation