Duan, N.N.DuanLuo, J.J.LuoWang, G.G.WangLiu, J.J.LiuSimoen, EddyEddySimoenMao, S.S.MaoRadamson, H.H.RadamsonWang, X.X.WangLi, J.J.LiWang, W.W.WangZhao, C.C.ZhaoYe, T.T.Ye2021-10-232021-10-2320160018-9383https://imec-publications.be/handle/20.500.12860/26583Reduction of NiGe/n- and p-Ge specific contact resistivity by enhanced dopant segregation in the presence of carbon during nickel germanidationJournal articlehttp://ieeexplore.ieee.org/document/7579625/