Quantifying LER and its impact on BEOL TDDB reliability at 20nm ½ pitch

Demuynck, StevenStevenDemuynckRoussel, PhilippePhilippeRousselStucchi, MicheleMicheleStucchiVersluijs, JankoJankoVersluijsGishia, GianniGianniGishiaTokei, ZsoltZsoltTokeiDe Roest, DavidDavidDe RoestBeyer, GeraldGeraldBeyer2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17010Quantifying LER and its impact on BEOL TDDB reliability at 20nm ½ pitchProceedings paper