Challenges of single-wafer wet cleaning for low temperature pre-epitaxial treatment of SiGe

Sano, K.K.SanoLeys, FrederikFrederikLeysDilliway, GabrielaGabrielaDilliwayLoo, RogerRogerLooMertens, PaulPaulMertensSnow, J.J.SnowIzumi, A.A.IzumiEitoku, A.A.Eitoku2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14420Challenges of single-wafer wet cleaning for low temperature pre-epitaxial treatment of SiGeProceedings paper