Treatments for reliability improvement in thick oxides diffusion and gate replacement (D&GR) I/O transistors

Ritzenthaler, RomainRomainRitzenthalerCho, Moon JuMoon JuChoSchram, TomTomSchramSpessot, AlessioAlessioSpessotSimoen, EddyEddySimoenO'Sullivan, BarryBarryO'SullivanDentoni Litta, EugenioEugenioDentoni LittaHoriguchi, NaotoNaotoHoriguchiThean, AaronAaronThean2021-10-242021-10-2420171757-2754https://imec-publications.be/handle/20.500.12860/29302Treatments for reliability improvement in thick oxides diffusion and gate replacement (D&GR) I/O transistorsJournal articlehttp://www.inderscienceonline.com/doi/abs/10.1504/IJMATEI.2017.085810