Measuring and Analyzing Contact Hole Variations in EUV Lithography

Severi, JorenJorenSeveriMack, Chris A.Chris A.MackLorusso, GianGianLorussoDe Simone, DaniloDaniloDe Simone2022-03-112022-03-112021978-1-5106-4051-10277-786XWOS:000672825700024https://imec-publications.be/handle/20.500.12860/39413Measuring and Analyzing Contact Hole Variations in EUV LithographyProceedings paper10.1117/12.2585308978-1-5106-4052-8WOS:000672825700024