De Gendt, StefanStefanDe GendtSnee, PeterPeterSneeCornelissen, IngridIngridCornelissenLux, MarcelMarcelLuxVos, RitaRitaVosMertens, PaulPaulMertensKnotter, D. M.D. M.KnotterHeyns, MarcMarcHeyns2021-09-302021-09-301998https://imec-publications.be/handle/20.500.12860/2491A novel resist and post-etch residue removal process using ozonated chemistriesProceedings paper