Influence of etch process sequence on damage formation in ultra low-k dielectrics

Redzheb, MuradMuradRedzhebSouriau, LaurentLaurentSouriaude Marneffe, Jean-FrancoisJean-Francoisde MarneffeBaklanov, MikhaïlMikhaïlBaklanov2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/22990Influence of etch process sequence on damage formation in ultra low-k dielectricsMeeting abstract