Atomic layer deposition of hafnium silicate from HfCl4, SiCl4, and H2O

Fedorenko, YaninaYaninaFedorenkoSwerts, JohanJohanSwertsMaes, JanJanMaesTois, E.E.ToisHaukka, S.S.HaukkaWang, C.GC.GWangWilk, G.G.WilkDelabie, AnneliesAnneliesDelabieDeweerd, WimWimDeweerdDe Gendt, StefanStefanDe Gendt2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12149Atomic layer deposition of hafnium silicate from HfCl4, SiCl4, and H2OJournal article