Plasma doping and reduced crystalline damage for conformally doped fin feld effect transistors

Lee, Jae WooJae WooLeeSasaki, YuichiroYuichiroSasakiCho, Moon JuMoon JuChoBoccardi, GuillaumeGuillaumeBoccardiRitzenthaler, RomainRomainRitzenthalerEneman, GeertGeertEnemanChiarella, ThomasThomasChiarellaBrus, StephanStephanBrusHoriguchi, NaotoNaotoHoriguchiGroeseneken, GuidoGuidoGroesenekenThean, AaronAaronThean2021-10-212021-10-2120130003-6951https://imec-publications.be/handle/20.500.12860/22659Plasma doping and reduced crystalline damage for conformally doped fin feld effect transistorsJournal article