Sewell, H.H.SewellMcCafferty, D.D.McCaffertyMarkoya, L.L.MarkoyaHendrickx, EricEricHendrickxHermans, JanJanHermansRonse, KurtKurtRonse2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/1118932nm node technology development using interference immersion lithographyProceedings paper