Does high-NA EUV require tighter mask roughness specifications: a simulation study

Jonckheere, RikRikJonckheereMelvin, Lawrence, IIILawrence, IIIMelvin2023-06-022023-03-222023-06-0220220277-786XWOS:000944102600020https://imec-publications.be/handle/20.500.12860/41330Does high-NA EUV require tighter mask roughness specifications: a simulation studyProceedings paper10.1117/12.2643247978-1-5106-5640-6WOS:000944102600020