Substrates and gate dielectrics: the materials issue for sub-22nm CMOS scaling

Caymax, MattyMattyCaymaxBellenger, FlorenceFlorenceBellengerBrammertz, GuyGuyBrammertzDekoster, JohanJohanDekosterDelabie, AnneliesAnneliesDelabieLoo, RogerRogerLooMerckling, ClementClementMercklingNguyen, DuyDuyNguyenNyns, LauraLauraNynsSioncke, SonjaSonjaSionckeVincent, BenjaminBenjaminVincentWang, GangGangWangVandervorst, WilfriedWilfriedVandervorstHeyns, MarcMarcHeyns2021-10-182021-10-182010-04https://imec-publications.be/handle/20.500.12860/16835Substrates and gate dielectrics: the materials issue for sub-22nm CMOS scalingMeeting abstract