Extraction of the top and sidewall mobility in FinFETs and the impact of fin-patterning processes and gate dielectrics on mobility

Iyengar, Vikram V.Vikram V.IyengarKottantharayil, AnilAnilKottantharayilTranjan, Farid M.Farid M.TranjanJurczak, GosiaGosiaJurczakDe Meyer, KristinKristinDe Meyer2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12342Extraction of the top and sidewall mobility in FinFETs and the impact of fin-patterning processes and gate dielectrics on mobilityJournal article