EUV mask repair using a combination of focused-electron-beam-induced processing and vacuum Atomic Force Microscopy

Bret, TristanTristanBretBaralia, GabrielGabrielBaraliaBaur, ChristofChristofBaurBudach, MichaelMichaelBudachHofmann, ThorstenThorstenHofmannEdinger, KlausKlausEdingerMagana, JohnJohnMaganaJonckheere, RikRikJonckheereVan Den Heuvel, DieterDieterVan Den Heuvel2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/18623EUV mask repair using a combination of focused-electron-beam-induced processing and vacuum Atomic Force MicroscopyOral presentation