Defect printability for 100-nm design rule using 193nm lithography

Philipsen, VickyVickyPhilipsenJonckheere, RikRikJonckheereKohlpoth, StephanieStephanieKohlpothTorres, AndresAndresTorres2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6720Defect printability for 100-nm design rule using 193nm lithographyProceedings paper