Verification and extension of the MBL technique for photoresist pattern shape measurement

Isawa, MikiMikiIsawaTanaka, MakiMakiTanakaKazumi, HideyukiHideyukiKazumiShishido, ChieChieShishidoHamamatsu, AkiraAkiraHamamatsuHasegawa, NorioNorioHasegawaDe Bisschop, PeterPeterDe BisschopLaidler, DavidDavidLaidlerLeray, PhilippePhilippeLerayCheng, ShauneeShauneeCheng2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/19108Verification and extension of the MBL technique for photoresist pattern shape measurementProceedings paper