Selective etching of SiGe for removal of dummy layers in fully silicided gate artchitectures

Snow, JimJimSnowVos, RitaRitaVosKottantharayil, AnilAnilKottantharayilKraus, HaraldHaraldKrausXu, KaidongKaidongXuGrinninger, F.F.GrinningerWagner, G.G.WagnerKovacs, F.F.KovacsMertens, PaulPaulMertens2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11250Selective etching of SiGe for removal of dummy layers in fully silicided gate artchitecturesProceedings paper