Arvind, ShikharShikharArvindWitting Larsen, EsbenEsbenWitting LarsenBezard, PhilippePhilippeBezardPetersen, JohnJohnPetersenDe Gendt, StefanStefanDe Gendt2024-09-192024-05-022024-09-1920240734-2101WOS:001199849900001https://imec-publications.be/handle/20.500.12860/43892Impact of vacuum ultraviolet photons on ultrathin polymethylmethacrylate during plasma etchingJournal article10.1116/6.0003541WOS:001199849900001193 NM PHOTORESISTEUV LITHOGRAPHYIONPMMASURFACEARGONPOLY(METHYLMETHACRYLATE)RADIATIONFILMSVUV