Erdmann, A.A.ErdmannArnz, M.M.ArnzMaenhoudt, MireilleMireilleMaenhoudtBaselmans, J.J.Baselmansvan Osnabrugge, J.C.J.C.van Osnabrugge2021-09-302021-09-301998https://imec-publications.be/handle/20.500.12860/2567Lithographic process simulation for scannersProceedings paper