Dry Etch Challenges for Patterning Middle-of-line (MOL) Contact Trench in Monolithic CFET (complementary FET)

Sarkar, T.T.SarkarRadisic, DunjaDunjaRadisicVega Gonzalez, VictorVictorVega GonzalezStiers, KarenKarenStiersSheng, C.C.ShengMontero Alvarez, DanielDanielMontero AlvarezJenkins, H.H.JenkinsDemand, M.M.DemandWang, P.P.WangLazzarino, FredericFredericLazzarinoHoriguchi, NaotoNaotoHoriguchi2024-06-062024-06-062024978-1-5106-7222-20277-786XWOS:001223585400009https://imec-publications.be/handle/20.500.12860/43997Dry Etch Challenges for Patterning Middle-of-line (MOL) Contact Trench in Monolithic CFET (complementary FET)Proceedings paper10.1117/12.3014213978-1-5106-7223-9WOS:001223585400009