Investigation of mask defectivity in full field EUV lithography

Jonckheere, RikRikJonckheereIwamoto, FumioFumioIwamotoLorusso, GianGianLorussoGoethals, MiekeMiekeGoethalsRonse, KurtKurtRonseKoop, H.H.KoopSchmoeller, T.T.Schmoeller2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12367Investigation of mask defectivity in full field EUV lithographyProceedings paper