Porogen residue free ultra low-k PECVD material: fabrication, optical and mechanical properties

Urbanowicz, AdamAdamUrbanowiczVanstreels, KrisKrisVanstreelsVerdonck, PatrickPatrickVerdonckCremel, MaximeMaximeCremelDe Gendt, StefanStefanDe GendtBaklanov, MikhaïlMikhaïlBaklanov2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/16338Porogen residue free ultra low-k PECVD material: fabrication, optical and mechanical propertiesMeeting abstract