Area-selective atomic layer deposition of TiN, TiO2, and HfO2 for advanced thin film patterning by delayed nucleation on plasma-treated amorphous carbon

Stevens, EricEricStevensTomczak, YoannYoannTomczakChan, BTBTChanAltamirano Sanchez, EfrainEfrainAltamirano SanchezParsons, GregoryGregoryParsonsDelabie, AnneliesAnneliesDelabie2021-10-262021-10-262018https://imec-publications.be/handle/20.500.12860/31857Area-selective atomic layer deposition of TiN, TiO2, and HfO2 for advanced thin film patterning by delayed nucleation on plasma-treated amorphous carbonMeeting abstract