Printability and propagation of stochastic defects through a study o defects programmed on EUV mask

Das, PoulomiPoulomiDasMoussa, AlainAlainMoussaBeral, ChristopheChristopheBeralGupta, MihirMihirGuptaSaib, MohamedMohamedSaibHalder, SandipSandipHalderCharley, Anne-LaureAnne-LaureCharleyLeray, PhilippePhilippeLeray2023-08-082023-06-202023-08-082021978-1-5106-4552-30277-786XWOS:000792657300015https://imec-publications.be/handle/20.500.12860/41844Printability and propagation of stochastic defects through a study o defects programmed on EUV maskProceedings paper10.1117/12.2602034978-1-5106-4553-0WOS:000792657300015