Krom, RaymondRaymondKromHellings, GeertGeertHellingsMitard, JeromeJeromeMitardWitters, LiesbethLiesbethWittersHikavyy, AndriyAndriyHikavyyEneman, GeertGeertEnemanWaldron, NiamhNiamhWaldronHeyns, MarcMarcHeynsHoffmann, Thomas Y.Thomas Y.HoffmannDe Meyer, KristinKristinDe Meyer2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/19198On the importance of source/drain series resistance in implant-free SiGe quantum well FETsProceedings paper