Vos, RitaRitaVosArnauts, SophiaSophiaArnautsBovie, IngeIngeBovieOnsia, BartBartOnsiaGaraud, SylvainSylvainGaraudXu, KaidongKaidongXuYu, HongYuHongYuYuKubicek, StefanStefanKubicekRohr, ErikaErikaRohrSchram, TomTomSchramVeloso, AnabelaAnabelaVelosoConard, ThierryThierryConardLeunissen, PeterPeterLeunissenMertens, PaulPaulMertens2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/13202Challenges with respect to high-k/metal gate stack etching and cleaningProceedings paper