Dummy oxide removal in high-K last process integration how to avoid silicon corrosion issue

Sebaai, FaridFaridSebaaiVeloso, AnabelaAnabelaVelosoTakahashi,TakahashiPacco, AntoineAntoinePaccoClaes, MartineMartineClaesSchaekers, MarcMarcSchaekersDe Gendt, StefanStefanDe GendtMertens, PaulPaulMertensStruyf, HerbertHerbertStruyf2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/23064Dummy oxide removal in high-K last process integration how to avoid silicon corrosion issueProceedings paper