Modeling Sicl4/O2 plasmas used for depositing SiO2 coatings or mask recovery

Tinck, StefanStefanTinckBoullart, WernerWernerBoullartBogaerts, AnnemieAnnemieBogaerts2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/21611Modeling Sicl4/O2 plasmas used for depositing SiO2 coatings or mask recoveryProceedings paper