Improving exposure latitude and aligning best focus through pitch by curing M3D effects with controlled aberrations

Franke, Joern-HolgerJoern-HolgerFrankeBekaert, JoostJoostBekaertBlanco, VictorVictorBlancoVan Look, LieveLieveVan LookWahlisch, FelixFelixWahlischLyakhova, KaterynaKaterynaLyakhovaVan Adrichem, PaulPaulVan AdrichemMaslow, Mark JohnMark JohnMaslowSchiffelers, GuidoGuidoSchiffelersHendrickx, EricEricHendrickx2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/32979Improving exposure latitude and aligning best focus through pitch by curing M3D effects with controlled aberrationsProceedings paperhttp://dx.doi.org/10.1117/12.2537104