A study on programmed defect propagation from design to mask to wafer using SEM metrology

Baskaran, BalakumarBalakumarBaskaranSaib, MohamedMohamedSaibReddy, Bojja AdityaBojja AdityaReddyBeggiato, MatteoMatteoBeggiatoGupta, MihirMihirGuptaBeral, ChristopheChristopheBeralCharley, Anne-LaureAnne-LaureCharleyLorusso, GianGianLorussoBekaert, JoostJoostBekaertLeray, PhilippePhilippeLeray2025-08-292025-08-292024978-1-5106-8157-60277-786XWOS:001536747100065https://imec-publications.be/handle/20.500.12860/46127A study on programmed defect propagation from design to mask to wafer using SEM metrologyProceedings paper10.1117/12.3035709978-1-5106-8158-3WOS:001536747100065