The etchback approach: enlarged process window for MuGFET gate etching

Degroote, BartBartDegrooteCollaert, NadineNadineCollaertRooyackers, RitaRitaRooyackersBaklanov, MikhaïlMikhaïlBaklanovBoullart, WernerWernerBoullartKunnen, EddyEddyKunnenJurczak, GosiaGosiaJurczakVanhaelemeersch, SergeSergeVanhaelemeersch2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10360The etchback approach: enlarged process window for MuGFET gate etchingOral presentation