Development of automatic OPC treatment and layout decomposition for double dipole lithography for low K1-imaging

Chiou, T.-B.T.-B.ChiouChen, A.A.ChenHsu, Stephen D.Stephen D.HsuEurlings, M.M.EurlingsHendrickx, EricEricHendrickx2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10216Development of automatic OPC treatment and layout decomposition for double dipole lithography for low K1-imagingProceedings paper