Hsia, Chih-HaoChih-HaoHsiaPark, SungHoSungHoParkWatanabe, SoichiSoichiWatanabeArnold, MarcoMarcoArnoldEl-Mekki, ZaidZaidEl-MekkiDelande, TinneTinneDelandeShafahian, EhsanEhsanShafahianMudigere Krishne Gowda, PunithPunithMudigere Krishne GowdaStruyf, HerbertHerbertStruyfRadisic, AlexAlexRadisic2025-06-052025-03-062025-06-052024979-8-3503-8518-22380-632XWOS:001411360600032https://imec-publications.be/handle/20.500.12860/45338Wafer-Level Electrochemical Deposition and Processing of Nanotwinned Cu RDLProceedings paper10.1109/IITC61274.2024.10732470979-8-3503-8517-5WOS:001411360600032