Nanometer scale characterisation of CoSi2 and NiSi induced strain in silicon by convergent beam electron diffraction

Benedetti, AlessandroAlessandroBenedettiBender, HugoHugoBenderTorregiani, CristinaCristinaTorregianiVan Dal, MarkMarkVan DalMaex, KarenKarenMaex2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/8562Nanometer scale characterisation of CoSi2 and NiSi induced strain in silicon by convergent beam electron diffractionJournal article