Zhao, C.Z.C.Z.ZhaoZhang, J.F.J.F.ZhangChang, M.H.M.H.ChangPeaker, A.R.A.R.PeakerHall, S.S.HallGroeseneken, GuidoGuidoGroesenekenPantisano, LuigiLuigiPantisanoDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeyns2021-10-172021-10-1720080021-8979https://imec-publications.be/handle/20.500.12860/14842Process-induced positive charges in Hf-based gate stacksJournal article