Strategies for CMOS low equivalent oxide thickness achievement with high-k oxides grown on Si(001) by MBE

Beccera, LoicLoicBecceraBaboux, NicolasNicolasBabouxPlossu, CaroleCarolePlossuMerckling, ClementClementMercklingEl-Kazzi, MarioMarioEl-KazziSaint-Girons, GuillaumeGuillaumeSaint-GironsVilquin, BertrandBertrandVilquinHollinger, GuyGuyHollinger2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13360Strategies for CMOS low equivalent oxide thickness achievement with high-k oxides grown on Si(001) by MBEProceedings paper