Manufacturability issues for application of silicides in 0.25 μm CMOS process and beyond

Wang, QingfengQingfengWangLauwers, AnneAnneLauwersJonckx, FrankyFrankyJonckxde Potter de ten Broeck, MurielMurielde Potter de ten BroeckChen, Chun-ChoChun-ChoChenMaex, KarenKarenMaex2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1649Manufacturability issues for application of silicides in 0.25 μm CMOS process and beyondProceedings paper