Jonckheere, RikRikJonckheereVan Den Heuvel, DieterDieterVan Den HeuvelIwamoto, FumioFumioIwamotoStepanenko, NickolayNickolayStepanenkoMyers, AlanAlanMyersLamantia, MatthewMatthewLamantiaGoethals, MiekeMiekeGoethalsHendrickx, EricEricHendrickxRonse, KurtKurtRonse2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15548Investigation of EUV mask defectivity via full-field printing and inspection on waferProceedings paper